Plasma Etching
Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source. 757.83 KB 30 downloads
Generating high-efficiency neutral beams by using negative ions in an inductively...
Evaluation of silicon oxide cleaning using F2/Ar remote plasma processing. 187.08 KB 27 downloads
Evaluation of silicon oxide cleaning using F2/Ar remote plasma processing. ...
Dry etching of (Pb,Sr) TiO3 thin films using inductively coupled plasma. 149.55 KB 31 downloads
Dry etching of (Pb,Sr) TiO3 thin films using inductively coupled plasma. ...
Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma. 155.95 KB 32 downloads
Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma. ...
Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in a high-density CHF3 plasma. 270.67 KB 38 downloads
Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in...
Control of surface reactions in high-performance SiO2 etching. 759.40 KB 41 downloads
Control of surface reactions in high-performance SiO2 etching. ...
