The conference brought together scientists, engineers, students, and industry partners to exchange ideas on current developments in reactive sputtering and thin-film deposition. The programme spanned advances in reactive sputtering technologies, coatings for demanding environments, process control and modelling, plasma diagnostics, and film growth/characterisation, alongside an exhibition, poster session, and plenty of networking opportunities.
Highlights Included:
- Two-day specialist meeting bringing together scientists, engineers and students focused on reactive sputter deposition and thin-film coatings.
- Core technical themes spanning: new technologies in reactive sputtering, coatings for demanding environments, process control & modelling, plasma diagnostics, film growth & characterisation, innovative applications and industrial practice.
- Invited plenary / keynote-style talks from leading academic and industrial contributors.
- Strong “fundamentals → applications” coverage, with sessions addressing challenges like material composition, deposition dynamics, hysteresis behaviour, and diagnostics.
- Poster session enabling emerging work and informal technical discussion.
- A featured presentation by Holger Gerdes (Fraunhofer IST) on active monitoring/control of reactive sputtering at industrial scale.
Hiden Analytical at the Reactive Sputter Deposition Conference 2025:
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At the Hiden Analytical booth, attendees were able to meet Mike Thomas and Colin Robertson, and discuss how Hiden’s instrumentation could support their sputter deposition and thin film research and applications.
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Showcased Hiden’s vacuum and residual gas analysis (RGA) capabilities for reactive sputtering and wider vacuum-processing workflows.
- Highlighted how RGA and vacuum-system monitoring can help teams optimise deposition processes, detect impurities, and improve process repeatability.
We thoroughly enjoyed connecting with everyone and sharing how our portfolio could support your goals.
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