Hiden Analytical will be attending ALD for Industry 2026 from 17–18 March 2026 in Eindhoven, The Netherlands. Organised by EFDS, the event brings together the ALD community from across research and industry to explore the latest developments in atomic layer deposition, from fundamental science through to industrialisation and commercialisation.
What to expect at ALD for Industry 2026
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A focused international programme covering tutorials, conference sessions, exhibition, and poster presentations across the ALD field.
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Discussions spanning applications in microelectronics, Li-ion batteries, photovoltaics, optics, lighting, biomedicine, and quantum technology.
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An excellent opportunity to connect with researchers, industrial users, and technology suppliers working across thin film processing and surface engineering.
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Additional company and institute tours scheduled for 16 March, adding even more value for attendees arriving ahead of the main event.
Hiden Analytical at ALD for Industry 2026
If you’re attending ALD for Industry 2026, meet Wolfgang and Christoph, who will be representing Hiden Analytical from Benelux, to discuss how our mass spectrometry solutions can support ALD process development, monitoring, and film characterisation.
Areas we’ll be happy to discuss include:
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Process gas analysis for ALD and related vacuum processes using the HPR-30 Series, supporting sensitive gas and vapour analysis, contamination monitoring, and precursor/by-product tracking across a wide sampling pressure range.
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Plasma-assisted ALD diagnostics using the EQP Series, enabling rapid mass and energy analysis for plasma characterisation and reaction chemistry studies.
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Nanoscale surface analysis of ALD films using ToF-qSIMS, helping users gain detailed insight into thin film composition and surface structure.
Typical discussion points at the event
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Monitoring precursor delivery, reaction products, and purge efficiency in ALD processes
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Understanding plasma behaviour and reaction pathways in plasma-assisted ALD
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Identifying contamination, by-products, and transient process effects during thin film growth
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Linking process conditions to film quality through complementary gas-phase and surface analysis
We’re looking forward to meeting customers, collaborators, and new contacts in Eindhoven, and to discussing the latest challenges and opportunities in ALD process monitoring and thin film analysis.
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