Description
In this issue :
Customer Research
The reaction mechanism of the spray Ion Layer Gas Reaction process to deposit In2S3 thin films. Project Summary by: S. Gledhill, Helmholtz Zentrum Berlin, Germany
Overcoming the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering. Project Summary by: G. Greczynski, J. Jensen and L. Hultman, Linköping University, Sweden
Advantages of highly ionized pulse plasma magnetron sputtering (HIPIMS) of silver for improved E. coli inactivation. Project Summary by: J. Kiwi, EPFL-SBISIC- LPI, Switzerland
Composition and species evolution in a laser-induced LuMnO3 plasma. Project Summary by: M. Bator, Paul Scherrer Institute, Switzerland
In-situ monitoring of the growth of silver thin film – the influence of sputtering gas. Project Summary by: Michal Novotný, Institute of Physics, ASCR, vvi, Czech Republic
Products Referenced in this Issue
HPR-60 MBMS. The Hiden HPR-60 Molecular Beam Sampling Mass Spectrometer is a compact gas analysis system for analysis of neutrals, radicals and ions
EQP. The Hiden EQP is a combined Mass / Energy Analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes
PSM. The Hiden PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process
In the Press
Plasma Diagnostics for the Researcher. Hiden Analytical mass spectrometers provide direct real time plasma monitoring for analysis of both process ion and process neutral species, addressing a pressure range from 10E-3 to atmosphere and all featuring our latest, fastest Series 8 PC interface…
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