Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure using C4H2F6-based gas

Aug 2, 2024

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Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure using C4H2F6-based gas

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Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure using C4H2F6-based gas

Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure using C4H2F6-based gas

Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure using C4H2F6-based gas

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