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Vacuum Process Partial Pressure Diagnostics

by hiden | Oct 4, 2016

Vacuum processing is an essential element of diverse chemical, metallurgical and electronics-related procedures including vacuum furnacing, chemical vapour deposition, surface etching and evaporative coating, with process pressures ranging from ultrahigh vacuum (UHV)...

Advancing Pulsed Plasma Characterisation

by hiden | Oct 4, 2016

The performance of the Hiden family of plasma diagnostic tools is further advanced by integration of on-board timers for real-time pulsed plasma measurement, the fast gating fully controllable within the MASsoft operating program. Two timers provide ‘gate open/close’...

O2/Ar Ion Gun Spots the Difference

by hiden | Oct 4, 2016

The Hiden IG20 high-brightness gas ion gun is further enhanced by the introduction of a new beam optic and ion source configuration to enable both increased beam brightness AND beam contrast, together with a significant reduction in ultimate spot size. With a raster...

Molecular Beam Mass Spectrometer for Reactive Process Monitoring

by hiden | Oct 4, 2016

The Hiden HPR-60 mass spectrometer is a research tool conceived specifically for direct analysis of ions, radicals and neutral species in reactive processes, and will be of interest to researchers in the fields of plasma and transient chemistry, reaction kinetics,...